Nanostructure and optical propertes of porous silicon layer
In this paper nanostructures Porous silicon layers have been prepared by electrochemical etching (ECE) technique of (111) P-type silicon wafer with a solution Electrolytic HF: ethanol at a concentration of 1:2 with various anodization currents and etching time of 20 min.The morphological, structural and optical Skincare properties of nanostructure